Sigrid Ruprecht | Akateeminen Kirjakauppa

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TERNARY AND QUATERNARY SI(H)F-O, SI(H)F-N, AND SIF(-O)-N COMPOUNDS, DERIVATIVES SUBSTITUTED AT O AND N, AND FLUOROSILICATE SALTS

Werner Behrendt; Reinhard Haubold; Wolfgang Kurtz; Sigrid Ruprecht; Hans Schäfer; Friedrich Schröder; Carol Strametz
Springer (1997)
Kovakantinen kirja

1186,40 €

BINARY SPECIES OF SILICON AND FLUORINE

Edwin Hengge; Robert Schlögl; Claudia Heinrich-Sterzel; Jörn v. Jouanne; Peter Merlet; Alfred Pebler; Sigrid Ruprecht; Hans Schä
Springer (1992)
Kovakantinen kirja

1358,30 €

TERNARY SILICON-FLUORINE-HYDROGEN COMPOUNDS

Werner Behrendt; Reinhard Haubold; Hannelore Keller-Rudek; Sigrid Ruprecht; Hans Schäfer; Friedrich Schröder
Springer (1996)
Kovakantinen kirja

911,50 €

SC, Y, LA-LU. RARE EARTH ELEMENTS : COMPOUNDS WITH BORON

Hiltrud Hein; Hartmut Bergmann (ed.); Claus Koeppel; Gerhard Czack (ed.); Ursula Vetter; Hiltrud Hein (ed.); Eb Warkentin
Springer (2013)
Pehmeäkantinen kirja

68,20 €

GMELIN HANDBOOK OF INORGANIC AND ORGANOMETALLIC CHEMISTRY - 8TH EDITION

Hartmut Bergmann; Gerhard Czack; Hiltrud Hein; Sigrid Ruprecht; Ursula Vetter
Springer-Verlag Berlin and Heidelberg GmbH & Co. KG (1989)

151,20 €

Ternary and Quaternary Si(H)F-O, Si(H)F-N, and SiF(-O)-N Compounds, Derivatives Substituted at O and N, and Fluorosilicate Salts

Werner Behrendt, Reinhard Haubold, Wolfgang Kurtz, Sigrid Ruprecht, Hans Schäfer, Friedrich Schröder, Carol Strametz

1186,40 €

Springer
Sivumäärä: 289 sivua
Asu: Kovakantinen kirja
Julkaisuvuosi: 1997, 01.06.1997 (lisätietoa)
Kieli: Englanti

The volume covers some 750 Si-F and Si(H)-F species which have additional bonds to oxygen, nitrogen, or both; O- and N-organylsubstituted derivatives and fluorosilicates are included. With Si coordination numbers ranging from two to six, the volume presents a broad spectrum of chemical topics. They extend from theoretical calculations on the stabilities and properties of the unstable SiFHO structural isomers, via preparative and structural results for penta- and hexacoordinated SiF4 adducts, to the use of fluoroalkoxysilanes in the formation of silicon films at low temperature, and the various methods of manufacturing (NH4)2SiF6. The physical properties of the ions in this salt were also studied at length.

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