Spacer Engineered FinFET Architectures - High-Performance Digital Circuit Applications
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Tilaustuote | Arvioimme, että tuote lähetetään meiltä noin 10-13 arkipäivässä