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Desorption Induced by Electronic Transitions DIET V - Proceedings of the Fifth International Workshop, Taos, NM, USA, April 1–4,
97,90 €
Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
Sivumäärä: 348 sivua
Asu: Pehmeäkantinen kirja
Painos: Softcover reprint of
Julkaisuvuosi: 2011, 08.12.2011 (lisätietoa)
Kieli: Englanti
Tuotesarja: Springer Series in Surface Sciences 31
This volume in the Springer Series on Surface Sciences presents a recent account of advances in the ever-broadening field of electron-and photon-stimulated sur­ face processes. As in previous volumes, these advances are presented as the proceedings of the International Workshop on Desorption Induced by Electronic Transitions; the fifth workshop (DIET V) was held in Taos, New Mexico, April 1-4, 1992. It will be abundantly clear to the reader that "DIET" is not restricted to desorption, but has for several years included photochemistry, non-thermal surface modification, exciton self-trapping, and many other phenomena that are induced by electron or photon bombardment. However, most stimulated surface processes do share a common physics: initial electronic excitation, localization of the excitation, and conversion of electronic energy into nuclear kinetic energy. It is the rich variation of this theme which makes the field so interesting and fruitful. We have divided the book into eleven parts in order to emphasize the wide range of materials that are examined and to highlight recent experimental and theoretical advances. Naturally, there is considerable overlap between sections, and many papers would be appropriate in more than one part. Part I focuses on perhaps the most active area in the field today: electron attachment. Here the detection and characterization of negative ions formed by attachment of elec­ trons supplied externally from the vacuum are discussed. In addition, the first observations of negative ions formed by substrate photoelectrons are presented.

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Desorption Induced by Electronic Transitions DIET V - Proceedings of the Fifth International Workshop, Taos, NM, USA, April 1–4,
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ISBN:
9783642780820
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