Ehrenfried Zschech (ed.); Karen Maex (ed.); Paul S. Ho (ed.); Hisao Kawasaki (ed.); Tomoji Nakamura (ed.) American Institute of Physics (2006) Kovakantinen kirja
John Wiley & Sons Inc Sivumäärä: 512 sivua Asu: Kovakantinen kirja Julkaisuvuosi: 2007, 09.02.2007 (lisätietoa) Kieli: Englanti
The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.
