This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon.

Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.

• Valuable applications for industry, particularly in the fabrication of thin-film electronics
• Each chapter has been peer reviewed
• An important and timely contribution to the semiconductor literature