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Nano-CMOS Design for Manufacturability - Robust Circuit and Physical Design for Sub-65nm Technology Nodes
Ban P. Wong; Anurag Mittal; Greg W. Starr; Franz Zach; Victor Moroz; Andrew Kahng
John Wiley & Sons Inc (2008)
Kovakantinen kirja
129,20
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Recent Approaches in the Theory of Plates and Plate-Like Structures
Holm Altenbach; Svetlana Bauer; Victor A. Eremeyev; Gennadi I. Mikhasev; Nikita F. Morozov
Springer Nature Switzerland AG (2021)
Kovakantinen kirja
172,80
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Recent Approaches in the Theory of Plates and Plate-Like Structures
Holm Altenbach; Svetlana Bauer; Victor A. Eremeyev; Gennadi I. Mikhasev; Nikita F. Morozov
Springer Nature Switzerland AG (2022)
Pehmeäkantinen kirja
172,80
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ostoskoriin kpl
Siirry koriin
Nano-CMOS Design for Manufacturability - Robust Circuit and Physical Design for Sub-65nm Technology Nodes
129,20 €
John Wiley & Sons Inc
Sivumäärä: 408 sivua
Asu: Kovakantinen kirja
Julkaisuvuosi: 2008, 07.11.2008 (lisätietoa)
Kieli: Englanti
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions.

This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts:



Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance


Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability


Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM



Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.

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Tilaustuote | Arvioimme, että tuote lähetetään meiltä noin 4-5 viikossa | Tilaa jouluksi viimeistään 27.11.2024
Myymäläsaatavuus
Helsinki
Tapiola
Turku
Tampere
Nano-CMOS Design for Manufacturability - Robust Circuit and Physical Design for Sub-65nm Technology Nodeszoom
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ISBN:
9780470112809
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