Favanne de Montcervelle; La Tour d`Auvergne; comte de; Jaminet; J.; ill; Dall; William Healey; former owner. DSI Kniga po trebovaniyu Saatavuus: Tilaustuote
Gun Lundberg; Emil Tyberg; Maria Allström; Maria Estling Vannestål; Sheila Feldmanis; Gun Lundberg; Emil Tyberg Studentlitteratur AB (2009) Saatavuus: Loppuunmyyty Pehmeäkantinen kirja
Springer Sivumäärä: 216 sivua Asu: Kovakantinen kirja Painos: 1994 Julkaisuvuosi: 1994, 30.04.1994 (lisätietoa) Kieli: Englanti
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
