David G. Seiler (ed.); Alain C. Diebold (ed.); Robert McDonald (ed.); Caroline R. Ayre (ed.); Rajinder P. Khosla (ed.); Zol American Institute of Physics (2005) Moniviestin
David G. Seiler (ed.); Alain C. Diebold (ed.); Robert McDonald (ed.); C. Michael Garner (ed.); Dan Herr (ed.); Raji Khosla American Institute of Physics (2007) Moniviestin
David G. Seiler (ed.); Alain C. Diebold (ed.); Robert McDonald (ed.); C. Michael Garner (ed.); Dan Herr (ed.); Raji Khosla American Institute of Physics (2009) Kovakantinen kirja
David G. Seiler (ed.); Alain C. Diebold (ed.); Robert McDonald (ed.); Amal Chabli (ed.); Erik M. Secula (ed.) American Institute of Physics (2012) Moniviestin
David G. Seiler (ed.); Alain C. Diebold (ed.); Thomas J. Shaffner (ed.); Robert McDonald (ed.); Stefan Zollner (ed.); Khosl American Institute of Physics (2003) Kovakantinen kirja
David G. Seiler (ed.); Alain C. Diebold (ed.); Thomas J. Shaffner (ed.); Robert McDonald (ed.); W. Murray Bullis (ed.); Smi American Institute of Physics (2001) Moniviestin
The worldwide semiconductor community faces increasingly difficult challenges in the era of silicon nanotechnology and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed.
Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continuing the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The book also covers emerging nano-devices and the corresponding metrology challenges that arise.
