Karen J. Kirkby | Akateeminen Kirjakauppa

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ION IMPANTATION TECHNOLOGY : 16TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY; IIT 2006

Karen J. Kirkby (ed.); Russell Gwilliam (ed.); Andy Smith (ed.); David Chivers (ed.)
American Institute of Physics (2006)
Kovakantinen kirja

149,80 €

ION IMPLANTATION TECHNOLOGY - 16TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY; IIT 2006

Karen J. Kirkby; Russell M. Gwilliam; Andy Smith; David Chivers
American Institute of Physics (2006)
CD-ROM

121,70 €

Ion Impantation Technology : 16th International Conference on Ion Implantation Technology; IIT 2006

Karen J. Kirkby (ed.), Russell Gwilliam (ed.), Andy Smith (ed.), David Chivers (ed.)

149,80 €

American Institute of Physics
Sivumäärä: 664 sivua
Asu: Kovakantinen kirja
Painos: 2006
Julkaisuvuosi: 2006, 04.12.2006 (lisätietoa)
Kieli: Englanti
Tuotesarja: Accelerators, Beams, and Instrumentations

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

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